So I'm wondering if there is kind of rule of thumb or tip as to when to use hole pattern as datum feature
Use it when they "as a pattern" functionally constrain one or more of the part's orientation and/or translation degrees-of-freedom. If you choose a surrogate you will have to stack through the surrogate unnecessarily to predict chosen clearance/interferences.
is hole pattern manufacturing or inspection friendly as datum feature?
[ol A]
[li]Manufacturing can/may use any feature(s) they desire to fabricate the piece, in fact the pattern can be the final operation in the process... they just have to insure that when the piece is interrogated from the DRF that those features establish the related must conform to it.[/li]
[li]If the datum pattern is referenced "MMC" and the feature tolerances "MMC" and you intend to use attribute gauging then the application is fairly straight forward... The gage sucessfully fitted over the datum features and the toleranced features simultaneously would signal a "go" conformance you would just need then to check each local size of the datum features and related features to verify that they do not exceed their LMC size.[/li]
[li]If the datum pattern is referenced "RMB" and the feature tolerances "MMC" and you intend to use attribute gauging then the gauge details contacting the datum pattern features get more complicated in that they must expand/contract at their basic pattern locations until sequential uniform expansion constraining the eligible degree-of-freedom is achieved. The gage then if successfully fitted over the related features signals a "go" conformance you would just need then to check each local size of the related features to verify that they do not exceed their LMC size.[/li]
[li]If the datum pattern is referenced either “MMC” or "RMB" and the feature tolerances are "MMC" and you intend to use continuous data gauging then Coordinate Measuring Devices often have subroutines where an array of the pattern’s basic coordinates can be compared to an array of the pattern’s measured coordinates and solved for eligible “best-fit” rotations and translations to establish the DRF… then depending how sophisticated the software is written to interrogate the datum feature pattern surfaces for their UAMEs or their RAMEs some software can simulate attribute gauging with DRF mobility for all simultaneous requirements. Many older packages however cannot properly estimate or apply the DRF mobility entitlement unidirectional to all simultaneous requirements so it is best to disregard the option and instead consider the datum reference RMB. Most CMMs have a pattern fitting subroutine that can employed constrain eligible DOF and establish a candidate DRF “bestfit” from the array comparisons.[/li]
[li]In an open layout inspection the skill and experience of the inspector is key. One with experience and knowledge of the process can make rational assumptions, verify them, and set up his pattern balance and interrogation reasonably quick. Barring that most will set on one hole of the pattern and rotate another sufficiently removed from the first according to its polar coordinates and begin the estimation of conformance.
All in all each of these methods begin by modeling the functional relationship rather than a surrogate.[/li]
Paul[/ol]