Semiconductor fab power distribution

[v6racer]

I am designing power distribution on my first semiconductor fab. The building was purchased from another manufacturer and the engineer for that company specified 200% neutrals, K13 transformers and both isolated and non-isolated ground wires to the panels in the fab areas. The current owner is planning on purchasing used equipment, not yet purchased, that may or may not be similar to what was installed before. So I have to design to an array of tools that might show up and am searching for insight on why the previous engineer specified what he did.

 

[davidbeach]

Seems pretty typical, at least of what was being installed 20 years ago when I last worked on those type of projects.

When one this sentence into the German to translate wanted, would one the fact exploit, that the word order and the punctuation already with the German conventions agree.

-- Douglas Hofstadter, Jan 1982

 

[che12345]

"...semiconductor fab. The building was ... specified 200% neutrals, K13 transformers and both isolated and non-isolated ground wires to the panels in the fab areas..."
I have the following opinion for your consideration.
1. Assuming the existing building installation is with 200% Neutral and K13 transformers and both isolated and non-isolated ground wires to the panels in the fab areas......, it shows that the existing installation had taken prudent precaution in anticipation of possible high harmonic current, at a high cost !. It would be fine for new equipments, even they may NOT produce high harmonic current.
2. BTW : 200% Neutral and K13 transformers were specified are mainly to circumscribe problems arising by high harmonic current.
Che Kuan Yau (Singapore)

 

[IRstuff]

I think the only question is whether the new-ish equipment will draw more power than the originally installed equipment suite. Newer equipment (than the original) most likely will be more complex and potentially require more power. For example, photolithography equipment from 40 years ago used relatively simple optics and simple ultraviolet sources for photoresist exposure. More recent photolithographic equipment use deeper UV sources, which are ostensibly less electrically efficient, and the larger fields of view of the optics require even higher exposure intensities. Additionally, going from 1x magnification optics to 5x or 10x magnifications require even more intensity from the exposure source. Finally, photolithography is at the mercy of throughput requirements for attempting to make a profit on the production, so more wafers per hour requires additional exposures and more power.

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[v6racer]

IRStuff, The new loads are significant and require a demand factor I am not sure the customer will meet. The engineer in charge believes the old building ran 45%. I have to believe him because he was present.

 

[waross]

I have to believe him because he was present.

Or you could ask accounting for a couple of years of back copies of power bills and see the documentation of what the demand actually was.

--------------------
Ohm's law
Not just a good idea;
It's the LAW!