May 20, 2007 #1 Cleopatra Materials Joined Jan 5, 2003 Messages 10 Location DE Hi, I want to remove SiO2 layer which occurs naturally on the Si3N4 powders. But I do not want to use HF because it is not safe. Is it possible to remove SiO2 by using any other acids/bases? Any information is appreciated. Thanks for all.
Hi, I want to remove SiO2 layer which occurs naturally on the Si3N4 powders. But I do not want to use HF because it is not safe. Is it possible to remove SiO2 by using any other acids/bases? Any information is appreciated. Thanks for all.
May 20, 2007 #2 IRstuff Aerospace Joined Jun 3, 2002 Messages 44,919 Location US As far as I can remember, HF is pretty much it for liquid etchants. Plasma etching might be another avenue. TTFN FAQ731-376 Upvote 0 Downvote
As far as I can remember, HF is pretty much it for liquid etchants. Plasma etching might be another avenue. TTFN FAQ731-376