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remove SiO2 layer which occurs naturally on the Si3N4 powders

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Cleopatra

Materials
Joined
Jan 5, 2003
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10
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DE
Hi,

I want to remove SiO2 layer which occurs naturally on the Si3N4 powders. But I do not want to use HF because it is not safe. Is it possible to remove SiO2 by using any other acids/bases?
Any information is appreciated. Thanks for all.
 
As far as I can remember, HF is pretty much it for liquid etchants. Plasma etching might be another avenue.

TTFN

FAQ731-376


 
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