All,
Sorry I'm late coming into this thread. Some very interesting discussion, on patterns, grouping, and simultaneous requirements.
Here are a few initial comments:
I would say that leader lines are not directly involved in pattern creation. Fig. 8-16 in Y14.5-2009 unfortunately contradicts this, because the two surfaces are described in the text as controlled to each other with only leader lines connecting the profile FCF to the two surfaces. The consensus is (and I agree) that this was an error and there should have been a 2X annotation in Fig. 8-16. This was corrected in the latest version of the figure, Fig. 11-18 in Y14.5-2018.
The profile tolerance on features A and B in Fig. 4-22 is a good example to study. Here is my take on it:
-there are two features. In other words, the profile tolerance does not combine the two surfaces into one feature
-there is a true profile for each feature. The true profiles have a basic relationship to each other (parallel and offset by 20 mm)
-there is a tolerance zone for each feature. The tolerances follow the true profiles, and are thus parallel and offset by 20 mm
-the existence of basically related tolerance zones does not in itself constrain the two features relative to each other. There also needs to be a mechanism to require the zones to apply "simultaneously".
Unfortunately the word "simultaneous" has a special meaning in Y14.5, and it's confusing if we use this term when describing situations that do not involve datum features and datum reference frames
-Y14.5 uses some loose terminology to describe this. A "pattern" is defined in 1.3.43 as "two more features to which a locational geometric tolerance is applied and are grouped by one of the following methods: nX, n COAXIAL holes, ALL OVER, A<->B, n SURFACES, simultaneous requirements or INDICATED." So when Features are "grouped" by one of the methods listed, a "pattern" is created.
-I'll refer to these methods as "pattern-creating mechanisms".
-I like pylfrm's use of the term "alignment" to represent a spatial relationship between the actual part and the basic geometry
-the effect of a pattern-creating mechanism is that it imposes the requirement that the tolerance zones for all of the applicable FCF's be evaluated in the same alignment
-the 2X annotation is the pattern-creating mechanism in the Fig. 4-22 case. If it were not present, then there would not be the requirement to compare the actual part to both profile zones in the same alignment. In other words, each profile zone could be evaluated in a different alignment.
The effect of a pattern-creating mechanism is the same as the effect of a simultaneous requirement, which requires tolerance zones to be evaluated in the same datum reference frame. In fact, simultaneous requirements is one of the pattern-creating mechanisms listed above. I believe that the most difficult thing about this is the terminology.
Evan Janeshewski
Axymetrix Quality Engineering Inc.