PECVD recipe to obtain high refractive index

[zacks01]

Hello all,

I'm new here to eng-tips.com website. I have a question regarding PECVD ( Plasma Enhanced Chemical Vapor Deposition).

How to obtain high refractive index with knowing the ratio of combination of gas SiH4 & N2O in terms of flow rate (sccm) ? I'm trying to grow a SiO ( silicon oxide) layer on a wafer to obtain a high refractive index.

Meaning, how much gas flow (sccm) which combination will give out high refractive index, preferably to get around 1.5?

I've tried 150:450 for SiH4:N2, but the highest I can get for refractive index is 1.42.

Appreciate your help. Thank you.

Regards,
Zacks

 

[MacGyverS2000]

Why can't you determine the flow rate of each gas? That would certainly give you the combination ratio of the mixture...

Dan - Owner

http://www.Hi-TecDesigns.com