you want to compare the results to get the difference between serveral nitriding potential. I think you should analyse the compoud layer too. For that you can use Glow Discharge Optical Spectroscopy (GDOS), very fast and quite eccurate to get the N-, C- Profile in the Compound layer, or metallography (Light Microscopy, SEM) after etching with different etching agents (HNO3, Oberhoffer, Sodium Pikrat etc.)
Of course, you have to measure the hardness with Vicker (for normal layer thickness up to big thickness, indentation load 100 - 500 g, dependent on hardness value) or Knoop hardness for thin layer. You can better use Electron- Microprobe-Analyse (EMP)to get the N-distribution across your nitrided case, but it's expensive.
Good luck