I want to remove SiO2 layer which occurs naturally on the Si3N4 powders. But I do not want to use HF because it is not safe. Is it possible to remove SiO2 by using any other acids/bases?
Any information is appreciated. Thanks for all.
Sometime back we needed to remove a SiO2 layer form a metal. This was accomplished by an outfit in (Michigan) that used anhydrous HF a a relatively high temperature.
Work was then done using an electrolytic process and as I recall it used a Ca Salt. They were able to remove the SiO2 with very little damage to the substrate. I don't know how your substrate will stand up. I wasn't directly involved as this project was at the PHD level
Can you use something like a SS White abrasive blast system to clean your SiN4?
These are the people (Ti Coating) who accomplished the HF ion cleaning for us. It may not work as the process removes some nitride coatings. I think it's worth a phone call for information if nothing better than to eliminate this route.