Hi all,
I have seen lots of implants, B11, Bf2, P, As, O2, etc. but I recently have seen a Cesium implant into standard Si wafers. Anybody know what this Implant is for?
elf
Hi IR,
Sound like some kind of Ion Mass Analysis, I thought most labs used Argon for the sputtering part of that process. This process though is in a production Lab. After what you wrote I'm beginning to think that this might be a pre etch conditioning Implant. Process Engineers in the past have used heavy Ion Implants (BF2) to increase etching rates in certain areas of the wafer (step edges and such). Ce @ 133amu is certainly Heavy enough to do some serious damage.