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White Paper - Comparing Multi-Patterning at 5nm: SADP, SAQP, and SALELE

Self-aligned multi-patterning techniques such as SADP, SAQP, and SALELE are increasingly popular at advanced nodes, but each process has its pros and cons.

Understanding the subtle process sensitivities and limitations of each can help foundries make informed decisions when selecting the optimal solution for new technologies and enable designers to optimize their layouts for the best results.

IMEC and Mentor, a Siemens business collaborated to identify potentially less-obvious process and design limitations and trade-offs between the three SAMP techniques. Learn more in this paper.

To download, please complete the form on this page. Your download is sponsored by Mentor, a Siemens Business.

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