×
INTELLIGENT WORK FORUMS
FOR ENGINEERING PROFESSIONALS

Log In

Come Join Us!

Are you an
Engineering professional?
Join Eng-Tips Forums!
  • Talk With Other Members
  • Be Notified Of Responses
    To Your Posts
  • Keyword Search
  • One-Click Access To Your
    Favorite Forums
  • Automated Signatures
    On Your Posts
  • Best Of All, It's Free!
  • Students Click Here

*Eng-Tips's functionality depends on members receiving e-mail. By joining you are opting in to receive e-mail.

Posting Guidelines

Promoting, selling, recruiting, coursework and thesis posting is forbidden.

Students Click Here

Jobs

Si/Ge pieces surface cleaning

Si/Ge pieces surface cleaning

Si/Ge pieces surface cleaning

(OP)

I used to grow materials using UHVCVD on Si wafer. To prepare the wafer, we usually did RCA cleaning followed by N2 spin dry. And the growth was successful. Recently, we want to try some growth on Si/Ge pieces, but have this surface preparation problem. The spin dry machine can only accept 4" or 6" wafer but not pieces. We tried to use N2 gun to blow the pieces after chemical treatment. But the result was not so good, especially on the peripheral part of the pieces due to the possible water residue on the edge. Do you guys have any experience on pieces sample growth and give some advices? Thank you very much!

Red Flag This Post

Please let us know here why this post is inappropriate. Reasons such as off-topic, duplicates, flames, illegal, vulgar, or students posting their homework.

Red Flag Submitted

Thank you for helping keep Eng-Tips Forums free from inappropriate posts.
The Eng-Tips staff will check this out and take appropriate action.

Reply To This Thread

Posting in the Eng-Tips forums is a member-only feature.

Click Here to join Eng-Tips and talk with other members!


Resources